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Lithography: 12-PHL-ImmersionScanner

equipment

Institute of Microelectronics (IME)

What is it?
Immersion Scanner

Manufacturer: Nikon

Model Name: NSR S610C

Applications: The Nikon Tandem Stage design, which uses two stages with different functions to increase throughput, improve accuracy, and enhance long-term stability

Instrument Overview: Capable of printing 45nm half pitch patterns for volume production. Uses proprietary Nikon Local Fill Technology, which is proven to eliminate scanner-induced immersion defects with no bubbles, water spots, or backside wafer contamination

Technical features and specifications:
Resolution: ≦ 45 nm
Exposure light source: ArF excimer laser (193 nm wavelength)
Reduction ratio: 1:4
Exposure field: 26 × 33 mm
Overlay: ≦ 6.5 nm

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Instrument Manufacturer URL: NA

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Lithography: 12-PHL-ImmersionScanner

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