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Lithography: BR-PHL-Coater

equipment

Institute of Microelectronics (IME)

What is it?
Suss ACS300 Gen2 Track

Manufacturer: SUSS

Model Name: ACS 300

Applications: Capable of running 200 and 300mm wafer concurrently without mechanical changeover. Accept wide range of resist viscosity up to a few thousand CP. Able to perform photo resist and polyimide coating and developing in one system.

Instrument Overview: The ACS300 Gen2 is a coat and develop Litho track.

Technical features and specifications:
Able to coat thick photo resist and polyimide
Stage: Auto

Charges:
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Instrument Manufacturer URL: NA

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Lithography: BR-PHL-Coater

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