Thin film deposition: Multi-Chamber Cluster Deposition System @C5

What is it?
it is a multi-chamber cluster deposition system used to deposit Al/AlOx/Al tunnel junction (able to do deposition at tilt position, ion-milling and oxidation can do without breaking vacuum)

Manufacturer: AdNaNo

Model Name: JEB-D

Applications: Al metal thin film deposition and JJ formaion

Instrument Overview: "Multi-chamber cluster deposition systems are used to reliably deposit Josephson junctions and to facilitate ohmic contact between two different metal films. These systems can also perform dynamic or static in situ oxidation to produce uniformly controlled metal oxide after depositing a metal thin film. With e-beam deposition systems capable of reaching pressures below <5*10^-10 mbar, it is possible to create an Al metal film with an RMS roughness of < 1nm. Currently, the system is optimized for forming metal Josephson junctions."

Technical features and specifications:
deposition rate = 0.01 nm/s to 0.5nm/s, Chamber pressure = <5*10^-10 mbar,

Charges:
NA

Instrument Manufacturer URL: www.adnano-tek.com

Detailed Specifications:
custom made cluster system